Title of article
A global evaluation of stripping efficiency by TD-GCMS
Author/Authors
Danel، نويسنده , , A. and Veillerot، نويسنده , , M. and Louveau، نويسنده , , O. and Millet، نويسنده , , C. and Tardif، نويسنده , , F.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
7
From page
30
To page
36
Abstract
In this work, a global evaluation of stripping efficiency and resist poisoning by TD-GCMS is proposed. It is shown that TD-GCMS is very sensitive to post stripping residues: photoresist mainly and in a less extend sidewall polymers. This method allows the quantification of the stripping efficiency in the 99.99% range. TD-GCMS also offers a sensitive detection of the organic contamination left by the BEOL wet stripping responsible of resist poisoning: traces of solvent trapped in porous material.
Keywords
Gas chromatography , Stripping , contamination , Silicon wafer
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
2003
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2139381
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