Title of article :
A global evaluation of stripping efficiency by TD-GCMS
Author/Authors :
Danel، نويسنده , , A. and Veillerot، نويسنده , , M. and Louveau، نويسنده , , O. and Millet، نويسنده , , C. and Tardif، نويسنده , , F.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Abstract :
In this work, a global evaluation of stripping efficiency and resist poisoning by TD-GCMS is proposed. It is shown that TD-GCMS is very sensitive to post stripping residues: photoresist mainly and in a less extend sidewall polymers. This method allows the quantification of the stripping efficiency in the 99.99% range. TD-GCMS also offers a sensitive detection of the organic contamination left by the BEOL wet stripping responsible of resist poisoning: traces of solvent trapped in porous material.
Keywords :
Gas chromatography , Stripping , contamination , Silicon wafer
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
