Title of article :
Thermal stability of 1.55 μm quantum well laser structures grown by gas-source molecular beam epitaxy
Author/Authors :
Gordon ، نويسنده , , B.E. and Thompson، نويسنده , , D.A. and Robinson، نويسنده , , B.J. and Lee، نويسنده , , A.S.W.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Pages :
6
From page :
227
To page :
232
Abstract :
Full and partial InGaAsP quantum well, laser structures grown by gas source molecular beam epitaxy, have been subjected to various thermal anneal treatments. Room temperature photoluminescence has been used to measure changes in the quantum well emission wavelength. In all cases, the wavelength decreases (blue-shifts) after the anneal treatment and the details of this blue-shift with anneal time and temperature have been used to establish how specific grown in defects and defects produced through surface dissociation can be used to explain the thermally induced changes.
Keywords :
Epitaxy of thin films , Molecular Beam Epitaxy , Quantum well structure , Indium phosphide , Annealing
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Serial Year :
2003
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Record number :
2139712
Link To Document :
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