Title of article
Dislocation loops formed during the degradation of forward-biased 4H–SiC p-n junctions
Author/Authors
Vetter، نويسنده , , W.M. and Liu، نويسنده , , J.Q. and Dudley، نويسنده , , Brett M. and Skowronski، نويسنده , , M. and Lendenmann، نويسنده , , H. and Hallin، نويسنده , , C.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
5
From page
220
To page
224
Abstract
The partial dislocations that border triangle or parallelogram-shaped stacking faults formed during the degradation of p-n diodes fabricated on 4H–SiC wafers were determined by transmission X-ray topography to be dislocation loops of Burgers vector 1/3〈101̄0〉, the Shockley partial type, consistent with previously reported TEM results. Some were separated from axial screw dislocations also present in the sample, indicating that the axial dislocations were not involved in the loops’ nucleation; while others were seen to have interacted during their growth with the axial screw dislocations, distorting their shapes from those of ideal parallelograms.
Keywords
Silicon carbide crystals , Dislocation loops , Diodes , Device degradation , X-ray topography
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
2003
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2140270
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