Title of article
Oriented AlN films prepared with solid AlCl3 source by bias assisted Cat-CVD
Author/Authors
Huang، نويسنده , , A.P. and Wang، نويسنده , , G.J. and Xu، نويسنده , , S.L. and Zhu، نويسنده , , M.K. and Li، نويسنده , , G.H. and Wang، نويسنده , , Colin B. and Yan، نويسنده , , H.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
5
From page
161
To page
165
Abstract
In this paper, aluminum nitride (AlN) films have been successfully synthesized by taking solid AlCl3 as the source of atomic aluminum, with negative bias assisted catalytic chemical vapor deposition (Cat-CVD) on Si(1 0 0) substrate at low temperatures. Nitrogen (N2) and hydrogen (H2) were used as gas precursors. The results show that by using AlCl3 as the aluminum source AlN films with preferential orientation can be obtained under negative bias assistance by Cat-CVD. The effects of the bias during the deposition process are discussed in details.
Keywords
cat-CVD , Substrate bias , orientation , ALN
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
2004
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2141048
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