Photocatalytic TiO2 thin films prepared via a high-pressure crystallization process

Titania thin films with high photocatalytic activity are successfully synthesized by combining the metalorganic deposition method (MOD) and the high-pressure crystallization (HPC) process. The crystallization temperature of anatase-type TiO2 films is significantly reduced to as low as 150 °C. TiO2 thin films with crack-free surface and uniform morphology are obtained. The diffusion of silicon species from substrates into TiO2 films is effectively suppressed. The HPC-derived TiO2 thin films are demonstrated to have higher photocatalytic activity than those prepared via the conventional annealing process.