Title of article
Substrate-induced stress and the transformation behavior of sputter-deposited NiTi thin films
Author/Authors
Huang، نويسنده , , Xu and Liu، نويسنده , , Yong، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
4
From page
314
To page
317
Abstract
Ti–50.5at.%Ni thin film sputter-deposited at 450 °C shows a multi-stage phase transformation sequence. The transformation temperatures of the substrate-attached film are slightly higher than that of the same thin film in freestanding condition. An unusual triangular stress–temperature loop is observed which is associated with the R-phase transformation.
Keywords
sputtering , X-ray diffraction , Phase transformation , Thin film , shape memory
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Serial Year
2003
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Record number
2142184
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