Porogen concentration and its desorbing temperature dependence in porous silica film incorporated with ethylene groups

Porogen concentration and its desorbing temperature dependence in porous silica film incorporated with ethylene groups were investigated. The peak of pore size distribution evaluated by using N2 gas adsorption was about 1 nm, and this value did not depend on the porogen concentration. The porogen desorbed from the film below 450 °C, and the lowest desorbing temperature was 375 °C.