Title of article :
Scaling of dislocation cells in GaAs crystals by global numeric simulation and their restraint by in situ control of stoichiometry
Author/Authors :
Rudolph، نويسنده , , P. and Frank-Rotsch، نويسنده , , Ch. and Juda، نويسنده , , U. and Kiessling، نويسنده , , F.-M.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
5
From page :
170
To page :
174
Abstract :
Undoped GaAs crystals show dislocation cell patterns with cell dimensions of some hundred micrometer orders of magnitude larger than in metals. Nevertheless, the correlation between cell diameter and dislocation density obeys the same Holt relation. Experimental results of dislocation analysis in GaAs were correlated with global computation of the resolved shear stress distribution at growth relevant temperatures and scaled with the universal function d = Kρ−1/2 = αKGbτ−1, where d is the cell size, ρ the dislocation density, K, α the constants, G the shear modulus, b the magnitude of Burgers vector and τ is the resolved shear stress. Samples grown with in situ control of stoichiometry show nearly no dislocation patterning due to the minimised native point defect content needed for dislocation climb.
Keywords :
Stoichiometry , Gallium arsenide , Melt growth , Dislocation cells , Stress computing
Journal title :
MATERIALS SCIENCE & ENGINEERING: A
Serial Year :
2005
Journal title :
MATERIALS SCIENCE & ENGINEERING: A
Record number :
2147165
Link To Document :
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