Magnesium doped GaN grown by MOCVD

We have studied the optical and electrical characteristics of undoped and doped GaN layers. The n- and p-type layers have been prepared by low pressure MOCVD technique. Photoluminescence (PL) studies were carried at low temperature. In the PL spectra of undoped GaN layer, a low intensity band edge emission and a broad yellow emission band were observed. The donor–acceptor pair (DAP) emission and its phonon replicas were observed in Mg lightly doped GaN layer. The dominance of the blue and the yellow emissions increased in the PL spectra as the Mg concentration was increased. The X-ray diffraction was employed to study the structure of the layers. Both the undoped and the doped layers exhibited hexagonal structure. The samples were annealed and significant changes were not observed in Hall Effect and in the PL measurements, so we suggest that there is no need of a thermal annealing for magnesium acceptor activation.