Title of article
Effects of nitrogen ion implantation and implantation energy on surface properties and adhesion strength of TiN films deposited on aluminum by magnetron sputtering
Author/Authors
Liu، نويسنده , , Youming and Li، نويسنده , , Liuhe and Xu، نويسنده , , Ming and Cai، نويسنده , , Xun and Chen، نويسنده , , Qiulong and Hu، نويسنده , , Yawei and Chu، نويسنده , , Paul K.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
5
From page
140
To page
144
Abstract
The performance of tribological coatings depends greatly on the adhesion strength between the coatings and substrates. In this work, we investigated the influence of the ion implantation energy of nitrogen on the adhesion and surface properties of TiN deposited on aluminum substrate. Aluminum samples were implanted with 15 keV, 30 keV and 40 keV nitrogen ions before TiN films were deposited using magnetron sputtering in a custom-designed multi-functional ion implanter. The adhesion properties of the implanted TiN films were assessed using nano-scratch tests and were observed to vary with the nitrogen ion implantation energy. Our frictional test results show that an appropriate ion implantation energy and dose can improve the frictional behavior of TiN films deposited on aluminum.
Keywords
TiN films , Nitrogen ion implantation , frictional behavior , adhesion strength
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Serial Year
2006
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Record number
2149194
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