Investigation of gate edge effect on interface trap density in 3C–SiC MOS capacitors

This paper reports on investigation of the gate edge effect on the interface trap density characteristics of 3C–SiC MOS capacitors fabricated using four different gate materials and two SiO2 oxide preparation methods. Non-uniform distribution of interface trap densities under the gate was demonstrated by the presence of the gate edge effect, i.e. the dependence of Dit(E) on the ratio of gate perimeter to its area. rength of the gate effect in different gate/oxide material combinations was studied and it was found that it depends on gate thermal expansion coefficient and adhesion of the gate layer to the oxide layer. The Dit behaviour at shallow energy levels (0.25 eV) was attributed to the reaction of Pb-centres to mechanical stress. The behaviour of Dit at deeper levels was documented but could not be explained in this study.