Title of article :
Analysis of the device characteristics of AlGaN/GaN HEMTs over a wide temperature range
Author/Authors :
Zhao، نويسنده , , M. and Liu، نويسنده , , X.Y. and Zheng، نويسنده , , Jackie Y.K and Li، نويسنده , , Yankui and Ouyang، نويسنده , , Sihua، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2013
Pages :
6
From page :
465
To page :
470
Abstract :
In this study, we investigate the behavior of the current–voltage (I–V) characteristics of AlGaN/GaN HEMT in the temperature range of 223–398 K. Temperature dependent device characteristics and the current transport mechanism are reported. It is observed that the Schottky barrier height Φ increases and the ideality factor n decreases with temperature. There is a linear relationship between the barrier height and the ideality factor, which is attributed to barrier height inhomogeneities of AlGaN/GaN HEMT. The estimated values of the series resistances (Rs) are in the range of 144.2 Ω at 223 K to 74.3 Ω at 398 K. The Φ, n, Rs, Gm and Schottky leakage current values are seen to be strongly temperature dependent.
Keywords :
AlGaN high-electron-mobility transistor , temperature dependence , Current–voltage (I–V) characteristics , Reliability
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Serial Year :
2013
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Record number :
2150805
Link To Document :
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