Title of article :
Tensile strength of electrodeposited nanocrystalline Ni–W alloys with finely dispersed micrometer-sized array through-holes
Author/Authors :
Yamasaki، نويسنده , , Tohru and Oda، نويسنده , , Natsuko and Matsuoka، نويسنده , , Hiroyuki and Fukami، نويسنده , , Takeshi، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2007
Abstract :
Electrodeposited nanocrystalline Ni–W alloys with finely dispersed micrometer-sized array through-holes having diameters between 20 μm and 50 μm with a regular interval of 100 μm have been prepared by using UV (ultraviolet light)-lithographic techniques. In the case of monolithic nanocrystalline Ni–16 at.% W alloys with a grain diameter of 10–20 nm, the nominal tensile strength and the total elongation at fracture were attained at 1700 MPa and about 1%, respectively. With finely dispersed array through-holes having a diameter of 30 μm, the tensile strength and the total elongation at fracture increased up to about 2200 MPa and 1.2%, respectively. This may be due to the multiplication of highly localized yielding beginning at the finely dispersed array through-holes that can moderate the propagation of individual shear bands and cracks effectively.
Keywords :
Ni–W , Nanocrystalline materials , Finely dispersed micrometer sized array through-holes , UV-lithographic techniques , Electrodeposition , Shear bands deformation
Journal title :
MATERIALS SCIENCE & ENGINEERING: A
Journal title :
MATERIALS SCIENCE & ENGINEERING: A