Title of article :
Image deconvolution for defected crystals in field-emission high-resolution electron microscopy
Author/Authors :
He، نويسنده , , W.Z. and Li، نويسنده , , F.H. and Chen، نويسنده , , H and Kawasaki، نويسنده , , K and Oikawa، نويسنده , , T، نويسنده ,
Issue Information :
دوماهنامه با شماره پیاپی سال 1997
Pages :
11
From page :
1
To page :
11
Abstract :
It is demonstrated that for images taken with a field-emission high-resolution electron microscope the image deconvolution based on the weak-phase object approximation is available for restoring the crystal defects with the resolution close to the information resolution limit. The image deconvolution is firstly carried out for simulated [1 1 0] images of perfect and defect Si crystal structure models with different thickness. The deconvoluted images reveal the atomic pairs as black dumbbells and show the correct atomic configuration including that at the twin boundary and near the 60° dislocation core for the crystal thickness at least up to 76 إ. An experimental [1 1 0] image of SiGeSi has been restored to reveal an extended stacking fault sandwiched between two partial dislocations at the atomic level.
Keywords :
High-resolution electron microscopy , Image deconvolution , crystal defect , SiGeSi , SI
Journal title :
Ultramicroscopy
Serial Year :
1997
Journal title :
Ultramicroscopy
Record number :
2154840
Link To Document :
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