Title of article :
Identification of the first nucleated phase in submonolayer Ti deposited on Si(1 1 1)-7×7 by atomic resolution techniques
Author/Authors :
Hsu، نويسنده , , H.F and Hsu، نويسنده , , H.C and Chiang، نويسنده , , T.F. and Chen، نويسنده , , L.J and Hsiao، نويسنده , , H.L، نويسنده ,
Issue Information :
دوماهنامه با شماره پیاپی سال 2004
Abstract :
Ti5Si4 has been identified to be the first nucleated phase in submonolayer Ti deposited on the Si(1 1 1)-7×7 surface by ultrahigh vacuum scanning tunneling microscopy in conjunction with atomic-resolution transmission electron microscopy. The direct observation of the formation of clusters surrounded by the heavily damaged silicon lattice strongly suggested that Si is the dominant diffusing species in forming the silicide.
Keywords :
Submonolayer , 1)7×7 , 1 , Ti/Si(1 , First nucleated phase
Journal title :
Ultramicroscopy
Journal title :
Ultramicroscopy