Title of article
Formation of Pentacene wetting layer on the SiO2 surface and charge trap in the wetting layer
Author/Authors
Kim، نويسنده , , Chaeho and Jeon، نويسنده , , D.، نويسنده ,
Issue Information
دوماهنامه با شماره پیاپی سال 2008
Pages
4
From page
1050
To page
1053
Abstract
We studied the early-stage growth of vacuum-evaporated pentacene film on a native SiO2 surface using atomic force microscopy and in-situ spectroscopic ellipsometry. Pentacene deposition prompted an immediate change in the ellipsometry spectra, but atomic force microscopy images of the early stage films did not show a pentacene-related morphology other than the decrease in the surface roughness. This suggested that a thin pentacene wetting layer was formed by pentacene molecules lying on the surface before the crystalline islands nucleated. Growth simulation based on the in situ spectroscopic ellipsometry spectra supported this conclusion. Scanning capacitance microscopy measurement indicated the existence of trapped charges in the SiO2 and pentacene wetting layer.
Keywords
Charge trap , pentacene , Scanning capacitance microscopy , spectroscopic ellipsometry
Journal title
Ultramicroscopy
Serial Year
2008
Journal title
Ultramicroscopy
Record number
2157269
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