• Title of article

    Formation of Pentacene wetting layer on the SiO2 surface and charge trap in the wetting layer

  • Author/Authors

    Kim، نويسنده , , Chaeho and Jeon، نويسنده , , D.، نويسنده ,

  • Issue Information
    دوماهنامه با شماره پیاپی سال 2008
  • Pages
    4
  • From page
    1050
  • To page
    1053
  • Abstract
    We studied the early-stage growth of vacuum-evaporated pentacene film on a native SiO2 surface using atomic force microscopy and in-situ spectroscopic ellipsometry. Pentacene deposition prompted an immediate change in the ellipsometry spectra, but atomic force microscopy images of the early stage films did not show a pentacene-related morphology other than the decrease in the surface roughness. This suggested that a thin pentacene wetting layer was formed by pentacene molecules lying on the surface before the crystalline islands nucleated. Growth simulation based on the in situ spectroscopic ellipsometry spectra supported this conclusion. Scanning capacitance microscopy measurement indicated the existence of trapped charges in the SiO2 and pentacene wetting layer.
  • Keywords
    Charge trap , pentacene , Scanning capacitance microscopy , spectroscopic ellipsometry
  • Journal title
    Ultramicroscopy
  • Serial Year
    2008
  • Journal title
    Ultramicroscopy
  • Record number

    2157269