Author/Authors :
Hovsepyan، نويسنده , , Artur and Lee، نويسنده , , Huneung and Sargsyan، نويسنده , , Tigran and Melikyan، نويسنده , , Harutyun and Yoon، نويسنده , , Youngwoon and Babajanyan، نويسنده , , Arsen and Friedman، نويسنده , , Barry and Lee، نويسنده , , Kiejin، نويسنده ,
Abstract :
We observed tris-8-hydroxyquinoline aluminum (Alq3) thin films dependence on substrate heating temperatures by using a near-field microwave microprobe (NFMM) and by optical absorption at wavelengths between 200 and 900 nm. The changes of absorption intensity at different substrate heating temperatures are correlated to the changes in the sheet resistance of Alq3 thin films.
Keywords :
heating , near field , Alq3 , ABSORPTION , Microwave microprobe
