Title of article
Electron beam confinement and image contrast enhancement in near field emission scanning electron microscopy
Author/Authors
Kirk، نويسنده , , T.L. and De Pietro، نويسنده , , L.G. and Pescia، نويسنده , , D. and Ramsperger، نويسنده , , U.، نويسنده ,
Issue Information
دوماهنامه با شماره پیاپی سال 2009
Pages
4
From page
463
To page
466
Abstract
In conventional scanning electron microscopy (SEM), the lateral resolution is limited by the electron beam diameter impinging on the specimen surface. Near field emission scanning electron microscopy (NFESEM) provides a simple means of overcoming this limit; however, the most suitable field emitter remains to be determined. NFESEM has been used in this work to investigate the W (1 1 0) surface with single-crystal tungsten tips of (3 1 0), (1 1 1), and (1 0 0)-orientations. The topographic images generated from both the electron intensity variations and the field emission current indicate higher resolution capabilities with decreasing tip work function than with polycrystalline tungsten tips. The confinement of the electron beam transcends the resolution limitations of the geometrical models, which are determined by the minimum beam width.
Keywords
Field emission , SEM , STM
Journal title
Ultramicroscopy
Serial Year
2009
Journal title
Ultramicroscopy
Record number
2157545
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