Author/Authors :
Vila-Comamala، نويسنده , , Joan and Jefimovs، نويسنده , , Konstantins and Raabe، نويسنده , , Jِrg and Pilvi، نويسنده , , Tero and Fink، نويسنده , , Rainer H. and Senoner، نويسنده , , Mathias and Maaكdorf، نويسنده , , Andre and Ritala، نويسنده , , Mikko and David، نويسنده , , Christian، نويسنده ,
Abstract :
Further progress in the spatial resolution of X-ray microscopes is currently impaired by fundamental limitations in the production of X-ray diffractive lenses. Here, we demonstrate how advanced thin film technologies can be applied to boost the fabrication and characterization of ultrahigh resolution X-ray optics. Specifically, Fresnel zone plates were fabricated by combining electron-beam lithography with atomic layer deposition and focused ion beam induced deposition. They were tested in a scanning transmission X-ray microscope at 1.2 keV photon energy using line pair structures of a sample prepared by metalorganic vapor phase epitaxy. For the first time in X-ray microscopy, features below 10 nm in width were resolved.
Keywords :
X-ray microscopy , X-ray diffractive optics , atomic layer deposition , Electron-beam lithography
