Title of article
Broadening the applications of the atom probe technique by ultraviolet femtosecond laser
Author/Authors
Hono، نويسنده , , K. and Ohkubo، نويسنده , , T. and Chen، نويسنده , , Y.M. and Kodzuka، نويسنده , , M. and Ohishi، نويسنده , , K. and Sepehri-Amin، نويسنده , , H. and Li، نويسنده , , F. and Kinno، نويسنده , , T. and Tomiya، نويسنده , , S. and Kanitani، نويسنده , , Y.، نويسنده ,
Issue Information
دوماهنامه با شماره پیاپی سال 2011
Pages
8
From page
576
To page
583
Abstract
Laser assisted field evaporation using ultraviolet (UV) wavelength gives rise to better mass resolution and signal-to-noise ratio in atom probe mass spectra of metals, semiconductors and insulators compared to infrared and green lasers. Combined with the site specific specimen preparation techniques using the lift-out and annular Ga ion milling in a focused ion beam machine, a wide variety of materials including insulating oxides can be quantitatively analyzed by the three-dimensional atom probe using UV laser assisted field evaporation. After discussing laser irradiation conditions for optimized atom probe analyses, recent atom probe tomography results on oxides, semiconductor devices and grain boundaries of sintered magnets are presented.
Keywords
Atom probe , Laser atom probe , Field evaporation , Atom probe tomography
Journal title
Ultramicroscopy
Serial Year
2011
Journal title
Ultramicroscopy
Record number
2158196
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