High resolution imaging for charged particles using CR-39 and atomic force microscopy

Recently Atomic Force Microscopy (AFM) has been used for a readout of Solid State Nuclear Track Detectors (SSNTD). In this technique, the SSNTD is etched for very short time and scanned by an AFM to observe track etch pits. Etch pits of several hundred nm in diameter can be observed. We applied this technique to charged particle imaging using CR-39. CR-39 plates were etched for about 5 min in 27% NaOH solution at 70°C. Then very small etch pits were measured. A typical diameter of etch pits was below 1 μm and a typical etch pit depth was about several hundred nm. The obtained image has demonstrated a position resolution of less than 100 nm. Ion microbeam profiles were also measured by the system.