Title of article :
Influence of ultrasonic cavitation on passive film of stainless steel
Author/Authors :
Wang، نويسنده , , Bao-Cheng and Zhu، نويسنده , , Jin-hua، نويسنده ,
Issue Information :
فصلنامه با شماره پیاپی سال 2008
Pages :
5
From page :
239
To page :
243
Abstract :
The electrochemical behaviors of passive film of stainless steel 0Cr13Ni5Mo under the condition of static state (quiescence) and ultrasonic cavitation in the HCl solution have been studied by means of polarization curve, electrochemical impedance spectroscopy (EIS) and capacitance potential measurement. The results indicate that the passive film shows a multi layer structure distribution, and presents a p-type semiconductor property under the condition of quiescence. The stability of passive film decreases, the semiconducting property changes to an n-type semiconductor in the presence of cavitation. The amount of transition electrons from valence band because of cavitation is related to the height of Fermi level of passive film semiconductor.
Keywords :
Semiconductor , Electrochemical impedance spectroscopy , Ultrasonic Cavitation , Passive film , Stainless steel
Journal title :
Ultrasonics Sonochemistry
Serial Year :
2008
Journal title :
Ultrasonics Sonochemistry
Record number :
2189050
Link To Document :
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