Title of article :
Sub-nm figure error correction of an extreme ultraviolet multilayer mirror by its surface milling
Author/Authors :
Yamamoto، نويسنده , , Masaki، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Abstract :
Detailed calculation of reflection phase shows that surface milling of extreme ultraviolet multilayer mirrors after fabrication is useful for accurate correction of figure errors with a correction sensitivity of 0.1 nm. The optical principle of the correction is described and example calculations of phase shift and reflectance variation by the milling are shown with a Mo/Si multilayer structure at a wavelength of 12.8 nm.
Keywords :
Reflection phase , Extreme ultraviolet , Projection lithography , Figure error correction , Multilayer
Journal title :
Nuclear Instruments and Methods in Physics Research Section A
Journal title :
Nuclear Instruments and Methods in Physics Research Section A