Title of article :
Photodissociation thresholds of OH produced from CH3OH in solid neon and argon
Author/Authors :
Cheng، نويسنده , , Bing-Ming and Liu، نويسنده , , Chin-Ping and Lo، نويسنده , , Wen-Jui and Lee، نويسنده , , Yuan-Pern، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
4
From page :
1461
To page :
1464
Abstract :
Photodissociation thresholds of OH from CH3OH in solid Ne and Ar were determined via photolysis of CH3OH/Ne and CH3OH/Ar (1/200) samples in situ at 4 K. The samples were irradiated with VUV synchrotron radiation after dispersion by a Seya-Namioka monochromator. The OH photo-product was detected by means of laser-induced fluorescence technique. The increase of fluorescent intensity of OH was monitored and recorded after the matrix sample was irradiated at different wavelengths for 3–5 min. Photodissociation threshold energies of 7.13±0.02 eV (174.0±0.5 nm) and 7.08±0.04 eV (175.0±1.0 nm) were measured for OH production of CH3OH in solid Ne and Ar, respectively.
Keywords :
Matrix isolation , Photodissociation threshold , Methanol , Hydroxyl
Journal title :
Nuclear Instruments and Methods in Physics Research Section A
Serial Year :
2001
Journal title :
Nuclear Instruments and Methods in Physics Research Section A
Record number :
2192300
Link To Document :
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