Author/Authors :
Benbalagh، نويسنده , , Rabah and André، نويسنده , , Jean-Michel and Barchewitz، نويسنده , , Robert and Jonnard، نويسنده , , Philippe and Julié، نويسنده , , Gwénaelle and Mollard، نويسنده , , Laurent and Rolland، نويسنده , , Guy and Rémond، نويسنده , , Christian and Troussel، نويسنده , , Philippe and Marmoret، نويسنده , , Rémy and Filatova، نويسنده , , Elena O.، نويسنده ,
Abstract :
The design of efficient lamellar multilayer amplitude grating (LMAG) monochromators in terms of bandwidth and peak reflectivity for the soft-X-ray domain, covering the K emission of low atomic-number elements: B to Si, is considered. A Mo / B 4 C LMAG suited for spectrometry in this spectral domain has been designed, fabricated using electron beam lithography together with reactive ion etching and tested with success.
Keywords :
Multilayers , Diffraction gratings , Bragg reflectors , X-ray optics
