Title of article :
A new evaporator system for target preparation at Argonne National Laboratory
Author/Authors :
Greene، نويسنده , , John P. and Neubauer، نويسنده , , Janelle and Deligiannis، نويسنده , , Dino، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
4
From page :
58
To page :
61
Abstract :
As part of an equipment grant provided by DOE for an upgrade to the target laboratory, the procurement of a new, general purpose, high-vacuum deposition system necessary to insure reliable and continued availability of high-purity targets was recognized as a priority item. Recommended specifications for this system included an automated, high-vacuum pumping station, a deposition chamber capable of handling large area foils or installation of a substrate planetary system for uniform coating capabilities and incorporating state-of-the-art thin film technologies. A newly manufactured system, although expensive, should be sought so as to take advantage of any warranty. Several vendors were approached so as to determine a range of price, capabilities and performance before proceeding with a purchase.
Keywords :
Resistance heated source , Vacuum deposition , Large area target , sputtering
Journal title :
Nuclear Instruments and Methods in Physics Research Section A
Serial Year :
2006
Journal title :
Nuclear Instruments and Methods in Physics Research Section A
Record number :
2200488
Link To Document :
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