• Title of article

    Flip chip bumping technology—Status and update

  • Author/Authors

    Juergen Wolf، نويسنده , , M. and Engelmann، نويسنده , , Gunter and Dietrich، نويسنده , , Lothar and Reichl، نويسنده , , Herbert، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2006
  • Pages
    6
  • From page
    290
  • To page
    295
  • Abstract
    Flip chip technology is a key driver for new complex system architectures and high-density packaging, e.g. sensor or pixel devices. Bumped wafers/dice as key elements become very important in terms of general availability at low cost, high yield and quality level. Today, different materials, e.g. Au, Ni, AuSn, SnAg, SnAgCu, SnCu, etc., are used for flip chip interconnects and different bumping approaches are available. Electroplating is the technology of choice for high-yield wafer bumping for small bump sizes and pitches. Lead-free solder bumps require an increase in knowledge in the field of under bump metallization (UBM) and the interaction of bump and substrate metallization, the formation and growth of intermetallic compounds (IMCs) during liquid- and solid-phase reactions. Results of a new bi-layer UBM of Ni–Cu which is especially designed for small-sized lead-free solder bumps will be discussed.
  • Keywords
    Flip chip , Bumping , Electroplating , Packaging
  • Journal title
    Nuclear Instruments and Methods in Physics Research Section A
  • Serial Year
    2006
  • Journal title
    Nuclear Instruments and Methods in Physics Research Section A
  • Record number

    2201272