Title of article
Flip chip bumping technology—Status and update
Author/Authors
Juergen Wolf، نويسنده , , M. and Engelmann، نويسنده , , Gunter and Dietrich، نويسنده , , Lothar and Reichl، نويسنده , , Herbert، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
6
From page
290
To page
295
Abstract
Flip chip technology is a key driver for new complex system architectures and high-density packaging, e.g. sensor or pixel devices. Bumped wafers/dice as key elements become very important in terms of general availability at low cost, high yield and quality level. Today, different materials, e.g. Au, Ni, AuSn, SnAg, SnAgCu, SnCu, etc., are used for flip chip interconnects and different bumping approaches are available. Electroplating is the technology of choice for high-yield wafer bumping for small bump sizes and pitches. Lead-free solder bumps require an increase in knowledge in the field of under bump metallization (UBM) and the interaction of bump and substrate metallization, the formation and growth of intermetallic compounds (IMCs) during liquid- and solid-phase reactions. Results of a new bi-layer UBM of Ni–Cu which is especially designed for small-sized lead-free solder bumps will be discussed.
Keywords
Flip chip , Bumping , Electroplating , Packaging
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Serial Year
2006
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Record number
2201272
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