Author/Authors :
Ohashi، نويسنده , , Haruhiko and Senba، نويسنده , , Yasunori and Nagasono، نويسنده , , Mitsuru and Yabashi، نويسنده , , Makina and Tono، نويسنده , , Kensuke and Togashi، نويسنده , , Tadashi and Kudo، نويسنده , , Togo and Kishimoto، نويسنده , , Hikaru and Miura، نويسنده , , Takanori and Kimura، نويسنده , , Hiroaki and Ishikawa، نويسنده , , Tetsuya، نويسنده ,
Abstract :
A focusing mirror device was designed and installed in an extreme ultraviolet (EUV) beamline of the SPring-8 Compact SASE Source (SCSS). The horizontal and vertical sizes of the beam at the focal point were measured to be 22 and 26 μm with a working distance of 0.94 m at a wavelength of 60 nm. A high power density over 20 TW/cm2 was achieved. Ablation properties of some materials such as silicon, diamond and tantalum have been studied for determining the focused beam profile with a single shot irradiation.
Keywords :
EUV , Ablation , X-ray free electron laser , X-Ray mirror , Beamline , SPring-8 , Beam size
