First results of target preparation by the HIVIPP method in pressures higher than one bar

We recently developed a new variation for the deposition method named HIVIPP (HIgh energy VIbrational Powder Plating), which is based on the high-energy vibrational motion of powder in the high electric field between parallel electrodes at room temperature and in vacuum. The HIVIPP method is very simple and does not require any complicated mechanisms to prepare both supported (backed) and self-supporting targets. The motivation for the present work was a desire to explore whether it could be done successfully with pressures higher than one bar, with reactive gases or inert gases, and without a vacuum-pumping system. The first successful results are reported for depositions of metallic chromium and non-metallic silicon powders in nitrogen, oxygen, and air at >1 bar.