Title of article
Projection XEUV-nanolithography
Author/Authors
Chkhalo، نويسنده , , N.I. and Salashchenko، نويسنده , , N.N.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2009
Pages
3
From page
147
To page
149
Abstract
A short review of present state of the art of projection photolithography is given. Progress and main problems of the EUV lithography have received primary consideration. Advantages of using synchrotrons as sources of EUV radiation in commercial EUV scanners are considered. Present state of the art of EUV lithography in Russia is reported.
Keywords
Synchrotron radiation , Projection EUV lithography , XEUV multilayer optics
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Serial Year
2009
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Record number
2211101
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