Title of article :
Electronic and structural properties of reduced-charge montmorillonites
Author/Authors :
Gates، نويسنده , , W.P and Komadel، نويسنده , , Christopher and Madejovل، نويسنده , , A. and Bujdلk، نويسنده , , J and Stucki، نويسنده , , J.W and Kirkpatrick، نويسنده , , R.J، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2000
Pages :
15
From page :
257
To page :
271
Abstract :
Solid state silicon (29Si) and aluminum (27Al) nuclear magnetic resonance (NMR) spectroscopies were applied to a series of reduced-charge montmorillonites (RCMs) to discern changes in electronic and structural properties that are induced by Li fixation. Room temperature 29Si MAS NMR spectra revealed a consistent chemical shift to more negative values and increased line width of the main Q3(0Al) Si resonance with increasing levels of Li fixation in the RCM series. A decreased line width of the octahedral Al (Al[6]) environment was observed and may be attributed to formation of a more uniform electronic environment surrounding Al[6] as charge reduction occurs. No appreciable changes in the tetrahedral Al (Al[4]) peak were observed for the series, except for line broadening. Correlations of 29Si NMR chemical shifts with layer charge and infrared-active structural vibrations indicated that distortions in the Si–O–T bond angles (T=tetrahedral Si or Al) occurred, with the mean Si–O–T bond angle increasing, following charge reduction. These results are interpreted as evidence of a redistribution both of layer charge and an abatement of the fit between octahedral and tetrahedral sheets following Li fixation and charge reduction. Our results are consistent with the formation of pyrophyllite-like character in reduced-charge montmorillonite.
Keywords :
infrared spectroscopy , reduced-charge montmorillonites , Modified clays , Li fixation , Layer charge , MAS NMR spectroscopy
Journal title :
Applied Clay Science:an International Journal on the Application...
Serial Year :
2000
Journal title :
Applied Clay Science:an International Journal on the Application...
Record number :
2220378
Link To Document :
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