Title of article :
Accurate analysis of shallowly implanted solar wind ions by SIMS backside depth profiling
Author/Authors :
Heber، نويسنده , , Veronika S. and McKeegan، نويسنده , , Kevin D. and Burnett، نويسنده , , Donald S. and Duprat، نويسنده , , Jean and Guan، نويسنده , , Yunbin and Jurewicz، نويسنده , , Amy J.G. and Olinger، نويسنده , , Chad T. and Smith، نويسنده , , Stephen P.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2014
Pages :
13
From page :
61
To page :
73
Abstract :
A method to quantitatively determine the fluences of shallowly-implanted solar wind ions returned to Earth by the Genesis Discovery mission is described. Through backside depth-profiling, we recover nearly complete depth profiles of implanted solar wind for several nonvolatile elements, including Mg, Al, Ca, Cr, and, to a lesser extent, Na, in silicon targets that collected bulk solar wind and solar wind from specific velocity regimes. We also determine the fluences of the volatile elements C, N, and O in silicon targets that collected bulk solar wind. By the use of appropriately calibrated ion implanted standards, fluences as low as 2 × 1010 atoms cm− 2 can be determined with precision and accuracy typically in the few percent range. Specific approaches to sample preparation, sputtering artifacts during depth profiling by secondary ion mass spectrometry, and quantification including the production of ion implant standards are discussed.
Keywords :
Genesis mission , Solar wind analysis , Secondary ion mass spectrometry , Backside depth profiling , Ion implantation
Journal title :
Chemical Geology
Serial Year :
2014
Journal title :
Chemical Geology
Record number :
2262628
Link To Document :
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