Computer simulation of stereolithographic curing reactions: phenomenological versus mechanistic approaches

A new phenomenological modelling approach to study, simulate and optimise the curing processes of thermosetting materials for stereolithographic processes is proposed. The model was developed for light-initiated, thermal-initiated, light-initiated accelerated by heat, and light and thermal-initiated systems. This model includes the effects of initiator concentration, temperature and light intensity, predicting the diffusion-controlled effects that occur after vitrification, the phenomenon of unimolecular termination and the shrinkage effects. The model is numerically implemented through the finite element method and solved using both the Galerkin method for spatial approximation and the Crank-Nicolson method for temporal approximation. The model was experimentally verified showing a good correlation between experimental and predicted values.