Title of article :
Bottom-up strategy of materials fabrication: a new trend in nanotechnology of soft materials
Author/Authors :
Shimomura، نويسنده , , Masatsugu and Sawadaishi، نويسنده , , Tetsuro، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
6
From page :
11
To page :
16
Abstract :
Recent progresses in nanometer-scale molecular self-organization and mesoscopic pattern formation are reviewed from the view point of nanotechnology of bottom-up materials fabrication. Nanometer-scale layer-by-layer self-assemblies on nanoparticles will provide wide applications in many fields. The micro-contact printing technique is effectively used for up-sizing the nanostructured molecular assemblies as submicrometer- and micrometer-scale patterns. Dissipative structures formed in non-equilibrium systems as self-organized spatio-temporal structures are newly employed for the mesoscopic patterning of the nanostructured molecular assemblies.
Keywords :
Dissipative structure , Nano-technology , molecular self-assembly , Mesoscopic patterning , self-organization
Journal title :
Current Opinion in Colloid and Interface Science
Serial Year :
2001
Journal title :
Current Opinion in Colloid and Interface Science
Record number :
2304882
Link To Document :
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