Title of article :
Thermal performance of flat vapor chamber heat spreader
Author/Authors :
Hsieh، نويسنده , , Shou-Shing and Lee، نويسنده , , Ron-Yu and Shyu، نويسنده , , Jin-Cherng and Chen، نويسنده , , Shao-Wen، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
11
From page :
1774
To page :
1784
Abstract :
Experiments were performed to examine the spreading thermal resistance of centrally positioned heat sources and the thermal performance of a water charged, gravity assisted flat vapor chamber to be used for electronic cooling. Parametric studies including different heat fluxes and operating temperatures were conducted, and the effect of the relevant parameters on the cooling performance in terms of the spreading resistance was presented and discussed. The present vapor chamber heat spreader showed a heat removal capacity of 220 W/cm2 with a thermal spreading resistance of 0.2 °C/W.
Keywords :
IC cooling technology , Vapor chamber heat spreader , Evaporation and condensation
Journal title :
Energy Conversion and Management
Serial Year :
2008
Journal title :
Energy Conversion and Management
Record number :
2333926
Link To Document :
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