Title of article
Potential profile measurements on compact helical system (CHS) using a 200 keV heavy ion beam probe
Author/Authors
Fujisawa، نويسنده , , A and Iguchi، نويسنده , , H and Lee، نويسنده , , S and Crowley، نويسنده , , T.P and Hamada، نويسنده , , Y and Hidekuma، نويسنده , , S and Kojima، نويسنده , , M and Kubo، نويسنده , , S and Idei، نويسنده , , H and Nishimura، نويسنده , , K and Okamura، نويسنده , , S and Matsuoka، نويسنده , , K، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
3
From page
649
To page
651
Abstract
A 200 keV heavy ion beam probe system has been prepared to measure potential profiles in the compact helical system. Probing beam trajectory is successfully controlled by a secondary beam sweep system to keep the injection angle of the secondary beam constant during the radial scan. As a result, it was observed that the potential profile changes after the neutral beam heating is applied on electron cyclotron heated plasmas.
Journal title
Fusion Engineering and Design
Serial Year
1997
Journal title
Fusion Engineering and Design
Record number
2363712
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