Author/Authors :
Hong، نويسنده , , S.H. Tony Lee، نويسنده , , K.S. and Kim، نويسنده , , K.M. and Kim، نويسنده , , H.T. and Kim، نويسنده , , G.P. and Sun، نويسنده , , J.H. and Woo، نويسنده , , H.J. and Park، نويسنده , , J.M. and Kim، نويسنده , , W.C and Kim، نويسنده , , H.K and Park، نويسنده , , K.R. and Yang، نويسنده , , H.L. and Na، نويسنده , , H.K. and Chung، نويسنده , , K.S.، نويسنده ,
Abstract :
First boronization in KSTAR is reported. KSTAR boronization system is based on a carborane (C2B10H12) injection system. The design, construction, and test of the system are accomplished and it is tested by using a small vacuum vessel before it is mounted to a KSTAR port. After the boronization in KSTAR, impurity levels are significantly reduced by factor of 3 (oxygen) and by 10 (carbon). Characteristics of a-C/B:H thin films deposited by carborane vapor are investigated. Re-condensation of carborane vapor during the test phase has been reported.
Keywords :
Carborane , a-C/B:H thin film , KSTAR , Wall conditioning , Boronization
