Optimization of Chemical Texturing of Silicon Wafers Using Different Concentrations of Sodium Hydroxide in Etching Solution

Surface texturing is one of the methods that improve the conversion efficiency of silicon-based solar cells by increasing the light trapping. The anisotropic texturing of p-type silicon (100) surface was performed using alkaline etching solution of sodium hydroxide (NaOH) including isopropyl alcohol (IPA) and hydrazine hydrate. The optical properties of etched wafers were investigated using reflectance spectrometer and morphology of surface was studied using scanning electron microscopy (SEM). Influence of NaOH concentration on etched wafers was studied and optimum value of surface reflectance was obtained by applying the best concentration of alkaline solution (NaOH).