Title of article
Thermal Oxidation Times Effect on Structural and Morphological Properties of Molybdenum Oxide Thin Films Grown on Quartz Substrates
Author/Authors
Hojabri, Alireza Department of Physics - Karaj Branch, Islamic Azad University, Karaj , Hajakbari, Fatemeh Department of Physics - Karaj Branch, Islamic Azad University, Karaj , Ghodrat, Yalda Department of Physics - Karaj Branch, Islamic Azad University, Karaj
Pages
9
From page
103
To page
111
Abstract
Molybdenum oxide (α-MoO)thin films were prepared on quartz and silicon substrates by thermal oxidation of Mo thin films deposited using DC magnetron sputtering method. The influence of thermal oxidation times ranging from 60-240 min on the structural and morphological properties of the preparedfilms was investigated using X-ray diffraction, Atomic force microscopy and Fourier transform infrared spectroscopy. The XRD results revealed that the as deposited film was amorphous while those formed at thermal oxidation times between 60-180 min exhibited polycrystalline orthorhombic molybdenum oxides. The presence of (0k0) reflections in XRD patterns indicated the layered structure of α-MoO. Also the surface morphology of the films isdependent on the thermal oxidation times. The FTIR spectrum confirmed the formation of MoO3 and the peak at 992.53 cm-1 implythelayered structure of α-MoO3.
Keywords
Thermal oxidation , Thin film , MoO3 , layered structure , Structural Properties
Serial Year
2015
Record number
2496183
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