Pembangunan Bahan Fotopeka Silika Terdop Fosforus untuk Fabrikasi Pandu Gelombang Optik

This research was conducted to develop an optical waveguide made from phosphorus doped silica photosensitive material. The spin coating technique was conducted using a source in liquid form called tetraethyl orthosilicate, phosphoric acid and also PBF to produced phosphorus doped silica photosensitive waveguide and boron. In range between 1μm and 8 μm thickness, the doped silica photosensitive waveguide, showed refractive index modulation is reaching 1 *10-14 between 3 and 8 μm thickness. For each testing and photosensitive treatment process was run using a 366 nm UV source, 0.369 mW/cm2 at 50Hz pulse rate. For every samples produced from this exposure shows a deviation of their index value, which the UV exposure was held about 10 minutes. By using ArF or KrF laser inscriber with 10 mW power for example, exposure period needed was just between 20 to 30 seconds to change the refractive index of waveguide. Beside, compensation process also held to improve the performance due to the tolerance effect from the simulation process. In order to improve the efficiency of refractive index and the layer thickness of BPSG, a graphical user interface program has been successfully developed to accelerate and improve the accuracy of reading measured from manual prism coupler