Title of article :
HIGH EFFICIENCY GLOW DISCHARGE ION SOURCE
Author/Authors :
Rahman, M.M. Abdel Atomic Energy Authority - Nuclear Research Center - Accelerators Ion Sources Department, Egypt , Helal, A. Atomic Energy Authority - Nuclear Research Center - Accelerators Ion Sources Department, Egypt , Moustafa, O.A. Atomic Energy Authority - Nuclear Research Center - Accelerators Ion Sources Department, Egypt , Salam, F.W. Abdel Atomic Energy Authority - Nuclear Research Center - Accelerators Ion Sources Department, Egypt
Abstract :
In this paper, design and investigation of new ion source characteristics working onthe condition of the glow discharge has been carried out. The ion source is of self extractiontype and is featured with its small size (length, l = 3.54 cm, width, h = 3.14 cm), easyoperation and stable discharge. The best working conditions were found to be at dischargepressure in the range of 10^-4 mbar and gap distance between the cathode and the anode =5.5 mm. Internal and external operational characteristics have been studied at this optimum distance using hydrogen, nitrogen and argon gases.
Keywords :
Glow discharge ion source , plasma sputtering , etching processes
Journal title :
Journal of Nuclear and Radiation Physics
Journal title :
Journal of Nuclear and Radiation Physics
