Space–Time Coupled Finite Element Simulation of PECVD Reactor

In this paper, space–time distribution of nanoparticles, as predicted by the fluid model, is simulated using Galerkin based space–time coupled finite element methodology. The method is utilized to simulate the silane discharge process and the ensuing behavior of the affected particles as a function of time in a plasma enhanced chemical vapor deposition (PECVD) reactor. PECVD is a practical technique of producing thin silicon films. Simulation of this process, as modeled by a set of nonlinear partial differential equations, requires extensive resolution in time. An attempt at establishing a stable and convergent computational process was successful only when space–time coupled finite element methodology was utilized to simulate this problem. Details of the methodology along with results of a particular test case are presented.