Title of article
FP-LAPW calculations of ground state properties for AIN, GaN and In N compounds
Author/Authors
Daoudi, B. University of Sidi-Bel-Abbes - Applied Materials Laboratory, Algeria , Daoudi, B. Université de Ouargla - Laboratoire de Développement des Energies Renouvelables dans les Zones Arides et Sahariennes, Département de Physique, Algeria , Sehil, M. University of Sidi-Bel-Abbes - Applied Materials Laboratory, Algeria , Boukraa, A. Université de Ouargla - Laboratoire de Développement des Energies Renouvelables dans les Zones Arides et Sahariennes, Département de Physique, Algeria , Abid, H. University of Sidi-Bel-Abbes - Applied Materials Laboratory, Algeria
From page
65
To page
79
Abstract
We present first-principals all-electrons total-energy calculations concerning structural and electronic properties for the group III-V zinc-blend-like compounds AlN, GaN and InN using the full-potential linearized augmented plane wave (FP-LAPW) approach within the density functional theory (D.F.T) in the local density approximation (L.D.A) and the generalized gradient approximation (G.G.A) for the exchange correlations functional. Moreover, we have calculated bulk properties, including ground-state energies, lattice parameters, bulk modulus, its derivatives, cohesive energy and band structures. We find that the GGA yields improved physical properties for bulk AlN compared to the LDA. For GaN and InN, essentially no improvement is found: the LDA exhibits over binding, whereas the GGA shows a tendency for under binding. The degree of under binding and the overestimation of lattice parameters as obtained within the GGA increase on going from InN to GaN. Band structures are found to be very similar within the LDA and the GGA, for AlN, GaN and InN, therefore, the GGA does not offer any significant advantages.
Keywords
FP , LAPW , LDA , GGA , Semiconductors , Nitride compound.
Journal title
International Journal of Nanoelectronics and Materials
Journal title
International Journal of Nanoelectronics and Materials
Record number
2664779
Link To Document