Author/Authors :
Al-Ani, S.K.J. Al-Mustansiriyia University - College of Science - Physics Department, Iraq , Al-Dabbagh, J.B. Baghdad University - Physics Department, Iraq , Al-Ani, T.K. Baghdad University - Physics Department, Iraq , Al-Ani, A.A. Technology University - Department of enginnering materials, Iraq
Abstract :
The structural and mechanical (hardness) properties of thin Ni films of different thicknesses (t=4,10 and 36) mm deposited on coming glass substrate using lonbeam sputtering (IBS) technique under vacuum <10 Torr have been studied. The TEM and electron diffraction pattern for all silm thicknesses show a polycrystalline structure with average grain size (2,4,5)nm respectively. It is also found that the hardness increases as the film thickness increases give a maximum value of 185 kg/mm'at 1=36 nm.
