Author/Authors :
Ali, Sabah M. University of Technology - School of Applied Sciences - Department of Applied Physics, Iraq , Alwan, Alwan M. University of Technology - School of Applied Sciences - Department of Applied Physics, Iraq , Abass, Oday A. University of Technology - School of Applied Sciences - Department of Applied Physics, Iraq
Abstract :
Porous silicon (P-Si) has been produced in this work by photoelectrochemical (PEC) etching process. The irradiation has been achieved using diode laser of (2 W) power and 810 nm wavelength. The influence of various irradiation times on the properties of P-Si material such as P-Si layer thickness, surface aspect, pore diameter and the thickness of walls between pores as well as porosity and etching rate was investigated by depending on the scanning electron micrograph (SEM) technique and gravimetric measurements.
