Thin Films Microstructure, Thickness and Electrical Resistivity of Electrodeposited Ni1-xFex/ITO/Glass, Abnormal Alloy under OverallT <110> onto <211> Tilt

In this work, the electrodeposition of Ni1-xFex/ITO/Glass, thin films in sulfate bath was carrying out in the present work. The XRD technique, Scanning Electron microscopy SEM and EDS, Van Der Paw electrical measurements, have been used as principal work techniques to investigate the structural, compositional and electrical properties of Ni1-xFex obtained at different electrodeposition times. Thickness, roughness and surface quality were investigated by the medium of contact stylus profilometry measurement technique. The grain size D values were found to change in the range of 48 until 106 nm. It was shown that primary texture <110> tilt onto <211> at the 1080 s electrodeposition time. This may take part of abnormal behavior in our films. Electrical resistivity ρ, average grain size D, thickness t and roughness are majorly affected by overall texture tilt and present correlations between each other’s. Ni1-xFex films micrographs have been served for confirmation and achievement of the present work.