Title of article :
Design and fabrication of multi-layers antireflection coating consisting of MgF2 and SiO2
Author/Authors :
Salmaniannezhad ، Hassan Department of Physics - Laser and Plasma Research Institute - Shahid Beheshti University , Salmaniannezhad ، Hossein Department of Physics - Laser and Plasma Research Institute - Shahid Beheshti University , Zarei Moghadam ، Reza Department of Physics - Faculty of Sciences - Arak University , Khani ، Mohammadreza Department of Physics - Laser and Plasma Research Institute - Shahid Beheshti University , Ardani ، Mahdi Department of Physics - Laser and Plasma Research Institute - Shahid Beheshti University , Shokri ، Babak Department of Physics - Laser and Plasma Research Institute - Shahid Beheshti University
Abstract :
In this research, MgF2 and SiO2 thin films were prepared by the magnetron sputtering method on glass and ITO substrates. The crystal structure, morphology, and antireflection performance of the coatings were characterized using X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), and ultraviolet spectrophotometry (UV-vis) techniques, respectively. Furthermore, by utilizing both experimental characterization and optical film design tools, the best experimental parameters for every coating were identified. FESEM images confirmed proper growth of the layers on the substrates. EDAX analysis revealed that the manufactured layer consisted of Magnesium fluoride and silica. The study of optical properties demonstrated that the average transmission in the 400-1000 nanometer range exceeded 99%, indicating good agreement with theoretical results. Furthermore, the use of ITO as the substrate reduced the bandgap.
Keywords :
MgF2 and SiO2 thin films , sputtering , ITO substrates
Journal title :
Progress in Physics of Applied Materials
Journal title :
Progress in Physics of Applied Materials
