Title of article
Barrel-Spinning-Assisted Nickel Plating onto Copper in Sulphate Solution to Enhance Corrosion Resistance
Author/Authors
Susetyo ، F. B. Department of Mechanical Engineering - Universitas Negeri Jakarta , Widiyanto ، Y. A. Department of Mechanical Engineering - Universitas Negeri Jakarta , Soegijono ، B. proudtek Lab , Department of Geoscience - Universitas Indonesia , Yudanto ، S. D. Research Center for Metallurgy - National Research and Innovation Agency , Ismarwanti ، S. Research Center for Nuclear Material and Radioactive Waste Technology - National Research and Innovation Agency , Kriswarini ، R. Research Center for Nuclear Material and Radioactive Waste Technology - National Research and Innovation Agency , Rosyidan ، C. Department of Petroleum Engineering - Department of Petroleum Engineering, Universitas Trisakti
From page
1812
To page
1820
Abstract
Nickel (Ni) is an interesting candidate for corrosion protection of copper (Cu) due to its present passive area. Ni films with larger passive areas have better corrosion protection than those with smaller ones. In the present research, Ni films were produced over Cu. A barreling apparatus was employed to support the produced films in the sulphate solution. Various spinning speeds (0, 50, and 100 rpm) were used on the barrel while it was being processed. Several investigations were conducted, such as deposition rate, current efficiency, surface morphology, phase, film thickness, crystallographic orientation, and electrochemical properties. Increased spinning speed resulted in a decrease in the deposition rate, current efficiency, grain size, thickness, crystallite size, and exchange current density. Compared to a higher spinning speed, the decrease in spinning speed caused an increase in the oxygen content, surface roughness, and micro-strain. The higher speed of the barrel apparatus resulted in a lower corrosion rate Ni film of 0.147 mmpy. Moreover, the lower speed of the barrel apparatus resulted in a higher exchange current density Ni film of 0.997 A/cm².
Keywords
Film , Deposition Behavior , physical properties , Electrochemical properties
Journal title
International Journal of Engineering
Journal title
International Journal of Engineering
Record number
2776960
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