Title of article
Temperature Dependence of the Structure of Alkyl Monolayers on Si(111) Surface via Si–C Bond by ATR-FT-IR Spectroscopy
Author/Authors
Yamada، Ryo نويسنده , , Ara، Masato نويسنده , , Tada، Hirokazu نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
-491
From page
492
To page
0
Abstract
The temperature dependence of C–H stretching modes of alkyl monolayer formed on Si(111) surface was investigated by an attenuated total reflection Fourier transform infrared spectroscopy from room temperature up to 540 K. Continuous disordering of the monolayer was indicated from the gradual peak shifts toward higher frequency in C–H stretch modes upon heating. The irreversible conformational disorder was introduced in the monolayer above 440 K.
Keywords
prediction , Surface finish , Genetic-fuzzy system , Power requirement , grinding , Application-production research
Journal title
CHEMISTRY LETTERS
Serial Year
2004
Journal title
CHEMISTRY LETTERS
Record number
28041
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