Title of article :
Dissolution of copper thin films in hydroxylamine-based solutions
Author/Authors :
Wayne Huang، نويسنده , , Subramanian Tamilmani، نويسنده , , Srini Raghavan، نويسنده , , Robert Small، نويسنده ,
Pages :
8
From page :
365
To page :
372
Keywords :
Hydroxylamine , copper CMP , Corrosion inhibitors
Journal title :
Astroparticle Physics
Record number :
315773
Link To Document :
https://search.isc.ac/dl/search/defaultta.aspx?DTC=10&DC=315773
